Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… … Wikipedia
Secondary ion mass spectrometry — Infobox chemical analysis name = Secondary ion mass spectrometry caption =CAMECA IMS3f Magnetic SIMS Instrument acronym = SIMS classification =Mass spectrometry analytes = Solid surfaces, thin films related = Fast atom bombardment… … Wikipedia
Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… … Wikipedia
Low-energy ion scattering — LEIS redirects here; for the Hawaiian garland see Lei (Hawaii). Low energy ion scattering spectroscopy (LEIS), sometimes referred to simply as ion scattering spectroscopy (ISS), is a surface sensitive analytical technique used to characterize the … Wikipedia
High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… … Wikipedia
Zerstäubungskammer — jonų dulkinimo kamera statusas T sritis radioelektronika atitikmenys: angl. ion sputtering chamber vok. Zerstäubungskammer, f rus. камера для ионного распыления, f pranc. chambre de pulvérisation ionique, f … Radioelektronikos terminų žodynas
chambre de pulvérisation ionique — jonų dulkinimo kamera statusas T sritis radioelektronika atitikmenys: angl. ion sputtering chamber vok. Zerstäubungskammer, f rus. камера для ионного распыления, f pranc. chambre de pulvérisation ionique, f … Radioelektronikos terminų žodynas
jonų dulkinimo kamera — statusas T sritis radioelektronika atitikmenys: angl. ion sputtering chamber vok. Zerstäubungskammer, f rus. камера для ионного распыления, f pranc. chambre de pulvérisation ionique, f … Radioelektronikos terminų žodynas
камера для ионного распыления — jonų dulkinimo kamera statusas T sritis radioelektronika atitikmenys: angl. ion sputtering chamber vok. Zerstäubungskammer, f rus. камера для ионного распыления, f pranc. chambre de pulvérisation ionique, f … Radioelektronikos terminų žodynas
